China has built a prototype EUV (extreme ultraviolent) lithography machine in a high-security laboratory in Shenzhen. They ...

According to a report from Tom's Hardware, China's so-called "Frankenstein" EUV scanner was assembled from mismatched parts sourced through various channels, potentially including surplus equipment ...

The $400 machine will one day no longer be the crown jewel of the tech economy. Moore’s law will march on, processor power ...

China just pushed the semiconductor fight into a new chapter. Inside a sealed compound in Shenzhen, scientists built a prototype EUV lithography machine that Washington has tried to block for years.

Then at Intel's Foundry Direct event in April, Intel's chief technology and operations officer Naga Chandrasekaran stated that Intel had achieved "yield parity" between testing both low-NA ...

China’s new EUV prototype signals a faster path to semiconductor self-sufficiency, challenging Western chip-making dominance.

IMEC has successfully demonstrated the full wafer-scale fabrication of nanopores using ASML’s state-of-the-art extreme ...

China’s EUV effort reached 13.5 nm light generation, with chips not yet produced, helping you gauge AI supply risk and timing.

Reuters reports that scientists in China have created a prototype of a machine that could eventually be used to produce semiconductor chips capable of powering AI.

Chipmaker TSMC is expected to receive the first shipment of High Numerical Aperture NA Extreme Ultraviolet (High NA EUV) lithography machines from ASML before the end of the year. According to a ...