Startup Substrate is building next-generation semiconductor fabs using advanced X-ray lithography. This goes beyond extreme ...
TOKYO–Japan's Asahi Glass Co. Ltd. claims that it has developed the world's first synthetic quartz photomask substrate for 193-nm (argon fluoride) immersion lithography scanners. Asahi's QC-i ...
Several lithographic techniques are used for patterning in the nanoscale region. This article examines nanoimprint lithography (NIL), an emerging process that can produce sub-10nm features Nanoimprint ...
Lithography, based on conventional ink-printing processes, is a technique for patterning a variety of layers, such as conductors, semiconductors, or dielectrics, on a surface. Nanopatterning stretches ...
Photolithography involves the selective exposure of a photosensitive material to light, using a UV light source and a collimating optical system to create an image of a patterned mask onto a substrate ...
Results that may be inaccessible to you are currently showing.
Hide inaccessible results