A lithographic (litho) hotspot is a defect on a wafer that is created during manufacturing by a combination of systematic process variation and resolution enhancement technology (RET) limitations.

To use electron or ion beams to create nano-patterns the three methods that are typically used include ion beam milling, beam induced chemistry (deposition and etch), and beam induced lithography.

Electron lithography enables sub-100-nanometer patterning of a fully water-based hydrogel resist.

Flow-lithography is a lithographic method for continuously generating polymer microstructures for various applications such as bioassays, drug-delivery, cell carriers, tissue engineering and ...

San Jose, Calif. – Mapper Lithography BV disclosed the first test results of its multibeam, maskless lithography technology last week, claiming it has patterned a device at line-width geometries down ...

To address the technical challenges of manufacturing at 45-nm and smaller process geometries, including new patterning challenges such as double patterning, printability and scaling of very fine ...

Lithography, based on conventional ink-printing processes, is a technique for patterning a variety of layers, such as conductors, semiconductors, or dielectrics, on a surface. Nanopatterning stretches ...

(Nanowerk Spotlight) Conventional optical lithography is the standard and most common technique in the semiconductor industry and in the microfabrication research field. Although several approaches ...

How Does EUV Lithography Work? EUV Lithography is a state-of-the-art technology in chip manufacturing that uses highly energetic ultraviolet light to carve detailed patterns onto semiconductor ...

Beta Electronics has this week launched a new Kickstarter campaign to raise the $80,000 its development team require to take their new PCB printer and pattern transfer machine into production. The ...