Utilizing Secondary Ion Mass Spectrometry (SIMS) for in-line metrology is a newly emerging method of process control that requires contamination-free measurements, enabling SIMS on product wafers.

The Ion Beam Milling ion-etching process is vacuum based and is dependent on precise identification of interlayer breakthrough through multiple stacked thin-film layers each of perhaps only a few ...

Pulsed testbed the CSRm ion storage ring in Lanzhou, China. (Courtesy: IMP) Physicists in the US and China have studied how a pulsed beam of electrons can be used to cool a beam of high-energy ions – ...

A review of Ion Beam technology is presented in this paper. The key applications and benefits of using ion beam technology for etching processes in comparison to technology such as plasma etching will ...