BOULDER, Colo. — Researchers at the University of Colorado have boosted the output power and reduced the beam wavelength of their tabletop extreme ultraviolet (EUV) laser system built with ...
ST. CHARLES, Mo. — Raising the bar for next-generation lithography (NGL) sources, TRW Inc.'s Cutting Edge Optronics subsidiary here today demonstrated a 1500-watt laser module for an NGL technology ...
XLight raises $40 million to pursue new EUV light source for lithography machines China investing heavily in EUV technology development XLight's funding led by Playground Global, joined by several ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results